Pappers published by the Plasma & Coating Physics Group

Linköping University

In press

• Bipolar high power impulse magnetron sputtering for energetic ion- bombardment during TiN thin film growth without the use of a substrate bias, R.P.B. Viloan, J. Gu, J. Keraudy, L. Li, U. Helmersson, Thin Solid Films, corrected proof available online 4 June 2019. DOI

2019

• Nanostructured NiO/cubic SiC p-n Heterojunction Photoanode for Enhanced Solar Water Splitting, J. Jian, Y. Shi, S. Ekeroth, J. Keraudy, M. Syväjärvi, R. Yakimova, U. Helmersson, J. Sun, Journal of Materials Chemistry A 7, 4721 (2019). DOI


• Graphene decorated with iron oxide nanoparticles for highly sensitive interaction with volatile organic compounds, M. Rodner, D. Puglisi, S. Ekeroth, U. Helmersson, I. Shtepliuk, R. Yakimova, A. Skalberg, J. Uvdal, A. Schütze, J. Eriksson, Sensors 19, 918 (2019). DOI


• Growth of semi-coherent Ni and NiO dual-phase nanoparticles using hollow cathode sputtering, S. Ekeroth, S. Ikeda, R. Boyd, T. Shimizu, U. Helmersson, Journal of Nanoparticle Research 21, 37 (2019). DOI


• Bipolar HiPIMS for tailoring ion energies in thin film deposition, J. Keraudy, R.P.B. Viloan, M.A. Raadu, N. Brenning, D. Lundin, U. Helmersson, Surf. Coat. Technol. 359, 433 (2019). DOI

2018

• Low temperature (T_s/T_m < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate bias, M.M.S. Villamayor, J. Keraudy, T. Shimizu, R.P.B. Viloan, R. Boyd, D. Lundin, J.E. Greene, I. Petrov, U. Helmersson, J. Vac. Sci. Technol. A 36,061511 (2018). DOI


• Nucleation of titanium nanoparticles in an oxygen-starved envoronment, I: Experiments, R. Gunnarsson, N. Brenning, R.D. Boyd, U. Helmersson, J. Phys. D: Appl. Phys. 51, 455201 (2018). DOI


• Nucleation of titanium nanoparticles in an oxygen-starved environment, II: Theory, R. Gunnarsson, N. Brenning, L. Ojamae, E. Kalered, M.A. Raadu, U. Helmersson, J. Phys. D: Appl. Phys. 51, 455202 (2018). DOI


• Low-loss and tunable localized mid-infrared plasmons in nanocrystals of highly-degenerate InN, S. Askari, D. Mariotti, J.E. Stehr, J. Keraudy, U. Helmersson, Nano Letters 18, 5681 (2018). DOI


• Catalytic Nanotruss Structures Realized by Magnetic Self-Assembly in Pulsed Plasma, S. Ekeroth, E:P: Munger, R. Boyd, J. Ekspong, T. Wagberg, L. Edman, N. Brenning, U. Helmersson, Nano Letters 18, 3132 (2018). DOI


• Low-energy ion irradiation in HiPIMS to enable anatase TiO₂ selective growth, F. Cemin. M. Tsukamoto, J. Keraudy, V.G. Antunes, U. Helmersson, F. Alvarez, T. Minea, D. Lundin, J. Phys. D. 51, 2353011 (2018). DOI


• Effect of substrate temperature on the deposition of Al-Doped ZnO thin films using high power impulse magnetron sputtering Surface and Coatings Technology, M. Mickan, U. Helmersson, D. Horwat, Surf. Coat. Technol. 347, 245 (2018). DOI


• Phase separation within NiSiN coatings during reactive HiPIMS discharges: a new pathway to grow NixSi nanocrystals composites at low temperature, J. Keraudy, R.D. Boyd, T. Shimizu1, U. Helmersson, P.-Y. Jouan, Appl. Surf. Sci. 454, 148 (2018). DOI


• Performance tuning of gas sensors based on epitaxial graphene on silicon carbide, M. Rodner, J. Bahonjic, M. Mathisen, R. Gunnarsson, S. Ekeroth, U. Helmersson, I.G. Ivanov, R. Yakimova, J. Eriksson, Materials and Design 153, 153 (2018). DOI

2017

• Restoring the Properties of Transparent Al-Doped ZnO Thin Film Electrodes Exposed to Ambient Air, M. Mickan, M. Stoffel, H. Rinnert, U. Helmersson, D. Horwat, J. Phys. Chem. C, 121 14426, (2017). DOI


• Transition Mode Control in Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS), T. Shimizu, M. Villamayor, J. Keraudy, D. Lundin, U. Helmersson, J. Vac. Soc. Jpn., 60 346, (2017). DOI


• Doctoral thesis: Controlling the growth of nanoparticles produced in a high power pulsed plasma, R. Gunnarsson, Linköping studies in science and technology. Dissertations, ISSN 0345-7524; 1873 (2017). LiU E-Press


• Doctoral thesis: Deposition of Al-doped ZnO films by high power impulse magnetron sputtering, M. Mickan, Linköping studies in science and technology. Dissertations, ISSN 0345-7524; 1889 (2017). LiU E-Press

2016

• The role of Ohmic heating in dc magnetron sputtering, N. Brenning, J.-T. Gudmundsson, D. Lundin, T. Minea, M.A. Raadu, U. Helmersson, Plasma Sources Science and Technology, 25 065024 (2016). DOI, (Open access


• Synthesis of hydrogenated diamond-like carbon thin films using neon-acetylene based high power impulse magnetron sputtering discharges, A. Aijaz, S. Louring, D. Lundin, T. Kubart, J. Jensen, K. Sarakinos, U. Helmersson, J. Vac. Sci. Technol. A, 34, 061504 (2016). DOI, (Open access


• Nanoparticle growth by collection of ions: orbital motion limited theory and collision-enhanced collection, I. Pilch, L. Caillault, T. Tiberiu, U. Helmersson, A. Tal, I. Abrikosov, P. Münger, N. Brenning, Journal of Physics D: Applied Physics 49, 395208 (2016). DOI, (Open access


• Complex 3D nanocoral like structures formed by copper nanoparticle aggregation on nanostructured zinc oxide rods, R.D. Boyd, F. Söderlind, U. Helmersson, M. Odén, I. Pilch, Materials Letters 184, 127 (2016). DOI, (Open access after July 1, 2018)


• Room temperature deposition of homogeneous, highly transparent and conductive Al-doped ZnO films by reactive high power impulse magnetron sputtering, M. Mickan, U. Helmersson, H. Rinnert, J. Ghanbaja, D. Horwat, Solar Energy Materials and Solar Cells 157, 742 (2016). DOI


• The influence of pressure and gas flow on size and morphology of titanium oxide nanoparticles synthesized by hollow cathode sputtering, R. Gunnarsson, I. Pilch, R.D. Boyd, N. Brenning, U. Helmersson, J. Appl. Phys. 120, 044308 (2016). DOI, Open access


• Process stabilization by peak current regulation in reactive high-power impulse magnetron sputtering of hafnium nitride, T. Shimizu, M. Villamayor, D. Lundin, U. Helmersson, Journal of Physics D: Applied Physics 49, 065202 (2016). DOI, Open access


• Modified Epitaxial Graphene on SiC for Extremely Sensitive and Selective Gas Sensors, J. Eriksson, D. Puglisi, C. Strandqvist, R. Gunnarsson, S. Ekeroth, I.G. Ivanov, U. Helmersson, K. Uvdal, R. Yakimova, A. Lloyd Spetz, Materials Science Forum 858, 1145 (2016). DOI


• Compressive intrinsic stress originates in the grain boundaries of dense refractory polycrystalline thin films, D. Magnfalt, A. Fillon, R.D. Boyd, U. Helmersson, K. Sarakinos, G. Abadias, J. Appl. Phys. 119, 055305 (2016). DOI, Open access


• Titanium oxide nanoparticle production using high power pulsed plasmas, R. Gunnarsson, Linköping studies in science and technology, Licentiate Thesis No. 1748, ISSN 0280-7971, ISBN 978-91-7685-766-3 (2016). Open access

2015

• Synthesis of titanium-oxide nanoparticles with size and stoichiometry control, R. Gunnarsson, U. Helmersson, I. Pilch, J. Nanoparticle Research 17, 353 (2015). DOI, Open access


• Highly reflective rear surface passivation design for ultra-thin Cu(In,Ga)Se2 solar cells, B. Vermang, J.T. Watjen, V. Fjallstrom, F. Rostvall, M. Edoff, R. Gunnarsson, I. Pilch, U. Helmersson, R. Kotipalli, F. Henry, D. Flandre, Thin Solid Films 582, 300 (2015). DOI, Open access


• Are the argon metastables important in high power impulse magnetron sputtering discharges?, J.T. Gudmundsson, D. Lundin, G.D. Stancu, N. Brenning, T.M. Minea, Physics of Plasmas 22, 113508 (2015). DOI, Open access

2014

• Molecular dynamics simulation of the growth of Cu nano clusters from Cu ins in a plasma, A.A. Tal, E.P. Munger, I.A. Abrikosov, N. Brenning, I. Pilch, U. Helmersson, Phys. Rev. B 90. 165421 (2014). DOI, Open access


• Double oxide shell layer formed on a metal nanoparticle as revealed by aberration corrected (scanning) transmission electron microscopy, R. Boyd, I. Pilch, M. Garbrecht, M. Halvarsson, U. Helmersson, Materials Research Express 1, 025016 (2014). DOI, Open access


• Characterisation of Nanoparticle Structure by High Resolution Electron Microscopy, R.D. Boyd, R. Gunnarsson, I. Pilch, U. Helmersson, Journal of Physics Conference Series 522, 012065 (2014). DOI, Open access


• Dynamic competition between island growth and coalescence in metal-on-insulator deposition, B. Lü, V. Elofsson, E.P. Münger, and K. Sarakinos, Appl. Phys. Lett. 105, 163107 (2014). DOI


• Atomistic view on thin film nucleation and growth using highly ionized and pulsed vapour fluxes, K. Sarakinos, D. Magnfält, V. Elofsson, and B. Lü, Surf. Coat. Technol. 257, 326 (2014). DOI


• Unravelling the physical mechanisms that determine microstructural evolution in ultrathin Volmer-Weber films, V. Elofsson, B. Lü, D. Magnfält, E.P. Münger, and K. Sarakinos, J. Appl. Phys. 116, 044302 (2014). DOI


• Principles for designing sputter-based strategies for high-rate synthesis of dense and hard amorphous carbon thin films, A. Aijaz, K. Sarakinos, M. Raza, J. Jensen, U. Helmersson, Diamond and Related Materials 44, 117 (2014). DOI, Open access


• Epitaxial growth of γ-Al₂O₃ on Ti₂AlC(0001) by reactive high-power impulse magnetron sputtering, Per Eklund, Jenny Frodelius, Lars Hultman, Jun Lu, Daniel Magnfält, AIP Advances 4, 017138 (2014). DOI


• Deposition of yttria-stabilized zirconia thin films for solid oxide fuel cells by high power impulse magnetron sputtering and pulsed magnetron sputtering, Steffen Sønderby, Asim Aijaz, Ulf Helmersson, Kostas Sarakinos, Per Eklund, Surf. Coat. Technol. 240, 1, (2014). DOI, Open access


• The use of highly ionized pulsed plasmas for the synthesis of advanced thin films and nanoparticles, I. Pilch, D. Söderström, D. Lundin, U. Helmersson, KONA Powder and Particle Journal 31 171 (2014). Open access

2013

• Fast growth of nanoparticles in a hollow cathode plasma through orbit motion limited (OML) ion collection, Iris Pilch, Daniel Söderström, Mohammad I. Hasan, Ulf Helmersson, Nils Brenning, Appl. Phys. Lett. 103, 193108 (2013). DOI


• Atom insertion intro grain boundaries and stress generation in physically vapor deposited films, D. Magnfält, G. Abadias, and K. Sarakinos, Appl. Phys. Lett. 103, 051910 (2013). DOI


• Time-domain and energetic bombardment effects on the nucleation and coalescence of thin metal films on amorphous substrates, D. Magnfält,  V Elofsson, G Abadias, U Helmersson, K Sarakinos, J. Phys. D: Appl. Phys. 46, 215303 (2013). DOI


• Modeling the extraction of sputtered metal from a high power impulse hollow cathode discharge, M.I. Saadeh, I. Pilch, D. Söderström, D. Lundin, U. Helmersson, N. Brenning, Plasma, Sources Sci. Technol. 22, 035006 (2013). DOI


• Tilt of the columnar microstructure in off-normally deposited thin films using highy ionized vapor fluxes, V. Elofsson, D. Magnfält, M. Samuelsson, K. Sarakinos, J. Appl. Phys. 113, 174906 (2013). DOI


• Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides, M. Aiempanakit, A. Aijaz, D. Lundin, U. Helmersson, T. Kubart, J. Appl. Phys. 113, 133302 (2013). DOI


• Sputtering process for sputtering a target of carbon, U. Helmersson, N. Brenning, A. Aijaz, Swedish Patent 1150306 (2013).


• Size-Controlled Growth of Nanoparticles in a Highly Ionized Pulsed Plasma, I. Pilch, D. Söderström, N. Brenning, U. Helmersson, Appl. Phys. Lett. 102, 033108 (2013). DOI

2012

• ZrB2 thin films grown by high power impulse magnetron sputtering (HiPIMS) from a compound target, M. Samuelsson, J. Jensen, U. Helmersson, L. Hultman, H. Högberg, Thin Solid Films 526, 163 (2012). DOI


• Gas rarefaction and the time evolution of long high-power impulse magnetron sputtering pulses, C. Huo, M.A. Raadu, D. Lundin, J.T. Gudmundsson, A. Anders, N. Brenning, Plasma Sources Sci. Technol. 21, 045004 (2012). DOI


• A novel High-Power Pulse PECVD method, H. Pedersen, P. Larsson, A. Aijaz, J. Jensen, D. Lundin, Surf. Coat. Technol. 206, 4562 (2012)  DOI


• Swedish Patent 1050173, Plasmasputteringsprocess för att producera partiklar, PCT: WO 2011/105957 A1, Plasma Sputtering Process for Producing Particles, U. Helmersson, N. Brenning, D. Söderström.


• On the high temperature stability of gamma-Al2O3/Ti0.33Al0.67N coated WC-Co, K. Jiang, K. Sarakinos, A. Atiser, A. Reinholdt, J. Mayer, and J. M. Schneider, International Journal of Materials Research 103, 1 (2012). DOI


• The influence of ionization degree on film properties when using high power impulse magnetron sputtering, M. Samuelsson, D. Lundin, K. Sarakinos, F. Bjorefors, B. Walivaara, H. Ljungcantz, U. Helmersson, J. Vac. Sci. Technol. A 30, 031507 (2012). DOI


• Understanding deposition rate loss in high power impulse magnetron sputtering, N. Brenning, D. Lundin, M. A. Raadu, C. Huo, C. Vitelaru, G. D. Stancu, T. Minea, and U. Helmersson, Plasma Sources Sci. Technol. 21, 025005 (2012). DOI


• Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics, C. Vitelaru, D. Lundin, G. D. Stancu, N. Brenning, J. Bretagne, T. Minea, Plasma Sources Sci. Technol. 21, 025010 (2012). DOI


• The high power impulse magnetron sputtering discharge, J.T. Gudmundsson, N. Brenning, D. Lundin, U. Helmersson, J. Vac. Sci. Technol. A 30, 030801 (2012). DOI, free at Open access


• An introduction to thin film processing using high power impulse magnetron sputtering, D. Lundin and K. Sarakinos, J. Mater. Res. 27, 780, (2012). DOI


• A strategy for increased carbon ionization in magnetron sputtering discharges, A. Aijaz, K. Sarakinos, D. Lundin, N. Brenning, U. Helmersson, Diamond and Related Materials 23, 1, (2012). DOI


• Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films, K. Sarakinos, A. Braun, C. Zilkens, S. Mráz, J.M. Schneider, H. Zoubos, P. Patsalas, Surf. Coat. Technol. 206, 2706 (2012). DOI


• Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions, M. Samuelsson, K. Sarakinos, H. Hogberg, E. Lewin, U. Jansson, B. Walivara, H. Ljungcrantz, U. Helmersson, Surf. Coat. Technol. 206, 2396 (2012). DOI

2011

• Two-domain formation during the epitaxial growth of GaN (0001) on c-plane Al2O3 (0001) by high power impulse magnetron sputtering, M. Junaid, D. Lundin, J. Palisaitis, C.-L. Hsiao, V. Darakchieva, J. Jensen, P. O. A. Persson, P. Sandstrom, W.-J. Lai, L.-C. Chen, K.-H. Chen, U. Helmersson, L. Hultman, J. Birch, J. Appl. Phys., 110, 123519 (2011). DOI


• Studies of hysteresis effect in reactive HiPIMS deposition of oxides, T. Kubart, M. Aiempanakit, J. Andersson, T. Nyberg, S. Berg, U. Helmersson, Surf. Coat. Technol., 205, S303 (2011). DOI


• Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide, M. Aiempanakit, U. Helmersson, A. Aijaz, P. Larsson, R. Magnusson, J. Jensen, T. Kubart, Surf. Coat. Technol., 205, 4828 (2011). DOI


• Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides, Montri Aiempanakit, Tomas Kubart, Petter Larsson, Kostas Sarakinos, Jens Jensen, Ulf Helmersson, Thin Solid Films, 519, 7779 (2011).DOI


• Internal current measurements in high power impulse magnetron sputtering, D. Lundin, S.A. Sahab, N. Brenning, Chunqing Huo, U. Helmersson, Plasma Sources Sci. Technol. 20, 045003 (2011). DOI


• Deposition rate loss in high power impulse magnetron sputtering: understanding through computational modeling, D. Lundin, C. Huo, N. Brenning, M. A. Raadu, U. Helmersson, Technical Conference Proceedings of the Society of Vacuum Coaters (2011). Open access

2010

• Doctoral thesis: The HiPIMS Process, D. Lundin, Linköping studies in science and technology. Dissertations, ISBN 978-91-7393-419-0; 1305 (2010). LiU E-Press   


• Ab-initio calculations and synthesis of the off-stoichiometric half-Heusler phase Ni1-xMn1+xSb, M. Ekholm, P. Larsson, B. Alling, U. Helmersson, I.A. Abrikosov, J. Appl. Phys. 108, 093712 (2010). DOI   


• On the film density using high power impulse magnetron sputtering, M. Samuelsson, D. Lundin, J. Jensen, M. A. Raadu, J. T. Gudmundsson, U. Helmersson, Surf. Coat. Technol. 205, 591 (2010). DOI   


• Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias, Martina Lattemann, Ulf Helmersson, Joe E. Greene, Thin Solid Films, 518, 5978 (2010). DOI   


• Low-Temperature Superionic Conductivity in Strained Yttria-Stabilized Zirconia, Michael Sillassen, Per Eklund, Nini Pryds, Erik Johnson, Ulf Helmersson, Jørgen Bøttige, Adv. Funct. Mater. 20, 2071 (2010). DOI Corrections: Adv. Funct. Mater. 20, 3194 (2010).   


• Dual-magnetron open field sputtering system for sideways deposition of thin films, Asim Aijaz, Daniel Lundin, Petter Larsson, and Ulf Helmersson, Surf. Coat. Technol. 204, 2165 (2010). DOI

2009

• Faster-than-Bohm cross-B electron transport in strongly pulsed plasmas, N. Brenning, R. L. Merlino, D. Lundin, M. A. Raadu, and U. Helmersson, Phys. Rev. Lett. 103, 225003 (2009). DOI   


• Energy flux measurements in high power impulse magnetron sputtering, D. Lundin, M. Stahl, H. Kersten, U.Helmersson, J. Phys. D 42, 185202 (2009). DOI   


• Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering, D. Lundin, N. Brenning, D. Jädernäs, P. Larsson, E. Wallin, M. Lattemann, M.A. Raadu and U. Helmersson, Plasma Sources Sci. Technol. 18, 045008 (2009). DOI   


• On the electron energy in the high power impulse magnetron sputtering discharge, J.T. Gudmundsson, P. Sigurjonsson, P. Larsson, D. Lundin, U. Helmersson, J. Appl. Phys. 105, 123302 (2009). DOI   


• Low-temperature alpha-alumina thin film growth: ab initio studies of Al surface migration, E. Wallin. P. Munger, V. Chirita, U. Helmersson, J. Phys. D: Appl. Phys. 42, 125302 (2009). DOI, Free access through LiU E-press   


• Master thesis: Alternative method for deposition of alumina thin films, Daniel Magnfält, LITH-IFM-EX-09/2046-SE (2009).   


• Master thesis: Design and characterization of a synchronous co-axial double magnetron sputtering system, Asim Aijaz, LITH-IFM-EX-09/xxxx-SE (2009).   


• alpha-Alumina coatings on WC/Co substrates by physical vapor depositio, T.I. Selinder, E. Coronel, E. Wallin, U. Helmersson, International Journal of Refractory Metals and Hard Materials 27, 507 (2009). DOI

2008

• Doctoral thesis: Alumina Thin Films from Computer Calculations to Cutting Tools, E. Wallin, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 1221 (2008). LiU E-Press   


• Licentiate thesis: Plasma properties in high power impulse magnetron sputtering, D. Lundin, Linköping studies in science and technology. Thesis No. 1358, ISSN 0280-7971, ISBN 978-91-7393-932-4 (2008). LiU E-Press   


• A bulk plasma model for dc and HIPIMS magnetrons, N Brenning, I Axnäs, M A Raadu, D Lundin, U Helmerson, Plasma Sources Sci. Technol. 17, 045009 (2008). DOI   


• Cross-field ion transport during high power impulse magnetron sputtering, D. Lundin, P. Larsson, E. Wallin, M. Lattemann, N. Brenning, U. Helmersson, Plasma Sources Sci. Technol. 17, 035021 (2008). DOI   


• Hysteresis-free reactive high power impulse magnetron sputtering, E. Wallin, U. Helmersson, Thin Solid Films 516, 6398 (2008). DOI   


• Synthesis of alpha-Al2O3 thin films using reactive high power impulse magnetron sputtering, E. Wallin, T. I. Selinder, M. Elfwing, U. Helmersson, Europhysics Letters 82, 36002 (2008). DOI   


• Influence of residual water on magnetron sputter deposited crystalline Al2O3 thin films, E. Wallin, J.M. Andersson, M. Lattemann, U. Helmersson, Thin Solid Films 516, 3877 (2008). DOI   


• Anomalous electron transport in high power impulse magnetron sputtering, D. Lundin, U. Helmersson, S. Kirkpatrick, S. Rohde, and N. Brenning, Plasma Sources Sci. Technol. 17, 025007 (2008). DOI

2007

• Licentiate thesis: Alumina Thin Film Growth: Experiments and Modeling, E. Wallin, Linköping studies in science and technology. Thesis No. 1292, ISSN 0280-7971, ISBN 978-91-85715-98-5 (2007).   


• Master thesis: Properties of Arc Evaporated Ti-Si-C-N Hard Coatings, Andreas Hedin, LITH-IFM-EX-07/1761-SE (2007).   


• Master thesis: Growth of alumina thin films using reactive high power impulse magnetron sputtering, Staffan Swedin, LITH-IFM-EX-07/1712-SE (2007).   


• Master thesis: Microstructural evolution and properties of TiN thin films deposited by HIPIMS, Martina Ahlberg, LITH-IFM-EX-07/1710-SE (2007).   


• Investigation of structure and mechanical properties of magnetron sputtered monolayer and multilayer coatings in the ternary system Si–B–C, M. Lattermann, S. Ulrich, Surf.Coat.Technol. 201, 5564 (2007).   


• Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering, J. Alami, P. Eklund, J.M. Andersson, M. Lattermann, E. Wallin, J. Bohlmark, P. Persson, U. Helmersson, Thin Solid Films 515, 3434 (2007). Free via LiU E-press

2006

• Doctoral thesis: Fundamentals of High Power Impulse Magnetron Sputtering, J. Bohlmark, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 1014 (2006).   


• Master thesis: Investigations of interfacial microstructure of CrN coatings on HSS substrates pretreated by HIPIMS for adhesion enhancement, Daniel Jädernäs, LiTH-IFM-EX-06/1643-SE (2006)   


• Guiding the deposition flux in an ionized magnetron discharge, J. Bohlmark, M. Östbye, M. Lattemann, H. Ljungcrantz, T. Rosell, and U. Helmersson, Thin Solid Films 515, 1928 (2006). Free via LiU E-press


• High-power impulse magnetron sputtering of Ti-Si-C thin films from a Ti3SiC2 compound target, J. Alami, P. Eklund, J. Emmerlich, O. Wilhelmsson, U. Jansson, H. Högberg, L. Hultman, and U. Helmersson, Thin Solid Films 515, 1731 (2006). Free via LiU E-press


• The ion energy distributions and plasma composition of a high power impulse magnetron sputtering discharge, J. Bohlmark, M. Lattemann, J.T. Gudmundsson, A.P. Ehiasarian, Y. Aranda Gonzalvo, N. Brenning, and U. Helmersson, Thin Solid Films 515, 1522 (2006). Free via LiU E-press


• New approach in depositing thick, layered cubic boron nitride coatings by oxygen addition—structural and compositional analysis, M. Lattemann, S. Ulrich, J. Ye, Thin Solid Films 515, 1058 (2006).  


• Investigation of RuO2/4H-SiC Schottky diode contacts by deep level transient spectroscopy, D. Buc, L. Stuchlikova, U. Helmersson, W.H. Chang, I. Bello, Chemical Physics Letters 429, 617 (2006).  


• Ab initio studies of Al, O, and O2 adsorption on a-Al2O3 (0001) surfaces, Erik Wallin, J.M. Andersson, E.P. Munger, V. Chirita, U. Helmersson, Phys.Rev.B.74, 125409 (2006).  


• Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications, U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J.T. Gudmundsson, Thin Solid Films 513, 1 (2006). Free via LiU E-press


• Phase control of Al2O3 thin films grown at low temperatures, J.M. Andersson, E. Wallin, and U. Helmersson, Thin Solid Films513, 57 (2006).   


• Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures, J. Andersson, E. Wallin, P. Münger, U. Helmersson, J.Appl.Phys. 100, 033305 (2006).   


• RF dual magnetron sputtering deposition and characterization of nanocomposite Al2O3-ZrO2 thin films, D. Trinh, H. Högberg, J. Andersson, M. Collin, I. Reineck, U. Helmersson, and L. Hultman, J.Vac.Sci.Technol. A 24, 309 (2006).   


• Deep energy levels in RuO2/4H – SiC Schottky barrier structures, L. Stuchlikova, D. Buc, L. Harmatha, U. Helmersson, W. H. Chang, and I. Bello, Appl. Phys. Lett. 88, 153509 (2006).   


• Molecular content of the deposition flux during reactive Ar/O2 RF magnetron sputtering of Al, J.M. Andersson, E. Wallin, E.P. Münger, and U. Helmersson, Appl.Phys.Lett. 88, 054101 (2006).   


• Stress reduction in nanocomposite coatings consisting of hexagonal and cubic boron nitride, M. Lattemann, K. Sell, J. Ye, P.Å.O. Persson, and S. Ulrich, Surf.Coat.Technol. 200, 6459 (2006).   


• Investigation of High Power Impulse Magnetron Sputtering Pretreated Interfaces for Adhesion Enhancement of Hard Coatings on Steel, M. Lattemann, A.P. Ehiasarian, J. Bohlmark, P.Å.O. Persson, U. Helmersson, Surf.Coat.Technol. 200, 6495 (2006).   


• Reactive Film Growth of TiN by Using High Power Impulse Magnetron Sputtering (HIPIMS), J. Bohlmark, M. Lattemann, H. Stranning, T. Selinder, J. Carlsson, U. Helmersson, Society of Vacuum Coaters, 49th Annual Technical Conference Proceedings, Washington DC 2006, p. 334.   


• Ionized physical vapor deposition (IPVD) and especially high power impulse magnetron sputtering (HIPIMS), U. Helmersson, 4e Journees detude sur les nouvelles tendances en procedes magnetron et arc pour le depot de couches minces, Grenoble 2006, p. 1. 

2005

• Doctoral thesis: Controlling the Formation and Stability of Alumina Phases, J.M. Andersson, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 987 (2005).   


• Doctoral thesis: Plasma Characterization & Thin Film Growth and Analysis in Highly Ionized Magnetron Sputtering, J. Alami, Linköping studies in science and technology. Dissertations, ISSN 0345-7524 ; 948 (2005).   


• Master thesis: Aluminiumplätering och korrosinsskydd med polymerfilmer av strålkastarreflektorer, Pontus Mannerheim, LITH-IFM-EX-05/1502-SE (2005).   


• Master thesis: Study of tin whisker growth and their mechanical and electrical properties, Moheb Nayeri Hashemzadeh, LITH-IFM-EX-05/1499-SE (2005).   


• Master thesis: Control of deposition flux in ionized sputtering, Mikael Östbye, LITH-IFM-EX-05/1495-SE (2005).   


• Master thesis: Ion metal deposition of cylindrical substrates, Patrik Karlsson, LITH-IFM-EX-05/1491-SE (2005).   


• Master thesis: Piezoelectric coatings on implants - Sample preparation and construction of test equipment for in vitroexperiments, Annakarin Olsson, LITH-IFM-EX-05/1408-SE (2005).   


• Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge, K.B. Gylfason, J. Alami, U. Helmersson, and J.T. Gudmundsson, J.Phys.D 38, 3417 (2005).   


• Sol-gel synthesis and characterisation of Na0.5K0.5NbO3 thin films, Fredrik Söderlind, Per-Olov Käll, and Ulf Helmersson, J. Crystal Growth 281, 468 (2005).   


• Eliminating the hysterersis effect for reactive sputtering processes, T. Nyberg, S. Berg, U. Helmersson, and K. Hartig, Appl.Phys.Lett. 86, 164106 (2005).   


• High power impulse magnetron sputtering discharges and thin film growth: A brief review, U. Helmersson, M. Lattemann, J. Alami, J. Bohlmark, A.P. Ehiasarian, and J.T. Gudmundsson, Proceedings of the 48th Annual Technical Conference of the Society of Vacuum Coaters, April 23–28, 2005, Denver, CO, USA, p.458.  


• Plasma Composition and Ion Energies in High Power Impulse Magnetron Sputtering, J. Bohlmark, A.P. Ehiasarian, M. Lattemann, J. Alami, and U. Helmersson, , Proceedings of the 48th Annual Technical Conference of the Society of Vacuum Coaters, April 23–28, 2005, Denver, CO, USA, p.470.  


• Plasma dynamics in a highly ionized pulsed magnetron discharge, J. Alami, J.T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson, Plasma Sources Sci. Technol. 14, 525 (2005).   


• Ion-assisted physical vapor deposition for enhanced film properties on non-flat surfaces, J. Alami, P.O.Å. Persson, J. Böhlmark, J.T. Gudmundsson, D. Music, and U. Helmersson, J.Vac.Sci.Technol.A 23, 278 (2005).   


• Spatial electron density distribution in a high power pulsed magnetron discharge, J. Bohlmark, J.T. Gudmundsson, J. Alami, M. Latteman, U. Helmersson, IEEE Transactions on Plasma Science 33, 346 (2005).   


• Hydrogen sensing by NKN thin film with high dielectric constant and Ferro-electric property, Shinji Nakagomi, G. Wingqvist, A.E. Åbom, U.Helmersson, and A. Lloyd Spetz, Sensors & Actuators B 108, 490 (2005).   


• Ab initio calculations on the effects of additives on alumina phase stability, J.M. Andersson, E. Wallin, V. Chirita, E.P. Münger, and U. Helmersson, Phys. Rev. B 71, 014101 (2005).   


• Ionization of sputtered metals in high power pulsed magnetron sputtering, J. Bohlmark, J. Alami, C. Christou, A. Ehiasarian, and U. Helmersson, J. Vac. Sci. Technol.A 23, 18 (2005).